首页> 外国专利> SEMICONDUCTOR QUANTUM DOT ELEMENT, METHOD OF FORMING SEMICONDUCTOR QUANTUM DOT ELEMENT, AND SEMICONDUCTOR LASER USING SEMICONDUCTOR QUANTUM DOT ELEMENT

SEMICONDUCTOR QUANTUM DOT ELEMENT, METHOD OF FORMING SEMICONDUCTOR QUANTUM DOT ELEMENT, AND SEMICONDUCTOR LASER USING SEMICONDUCTOR QUANTUM DOT ELEMENT

机译:半导体量子点元素,形成半导体量子点元素的方法以及使用半导体量子点元素的半导体激光

摘要

PROBLEM TO BE SOLVED: To form a plurality of semiconductor quantum dots having heights equivalent to one another on a compound semiconductor substrate in order to control a band gap of the semiconductor quantum dots in a wide range.;SOLUTION: A semiconductor quantum dot element 1 includes the compound semiconductor substrate 2, the plurality of semiconductor quantum dots 3 formed on the compound semiconductor substrate 2, and is characterized in that the plurality of semiconductor quantum dots 3 are formed to gradually reduce the diameters thereof toward a peripheral side from the center of the compound semiconductor substrate 2 and to set the heights thereof nearly constant.;COPYRIGHT: (C)2009,JPO&INPIT
机译:解决的问题:在化合物半导体衬底上形成彼此高度相等的多个半导体量子点,以便在宽范围内控制半导体量子点的带隙。解决方案:半导体量子点元件1包括化合物半导体衬底2,在化合物半导体衬底2上形成的多个半导体量子点3,并且其特征在于,多个半导体量子点3形成为从其中心向着周边侧逐渐减小其直径。化合物半导体衬底2的高度设置为几乎恒定。版权所有:(C)2009,JPO&INPIT

著录项

  • 公开/公告号JP2009016562A

    专利类型

  • 公开/公告日2009-01-22

    原文格式PDF

  • 申请/专利权人 TOSHIBA CORP;

    申请/专利号JP20070176431

  • 发明设计人 MANAGAKI NOBUTO;

    申请日2007-07-04

  • 分类号H01S5/343;

  • 国家 JP

  • 入库时间 2022-08-21 19:42:09

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