CONTAMINANT REMOVING APPARATUS, CONTAMINANT REMOVING MECHANISM AND VACUUM THIN-FILM FORMATION WORKING DEVICE

摘要

PROBLEM TO BE SOLVED: To provide a contaminant removing method and the like by which a film (contaminant) deposited on a rear side end portion or a side surface of a substrate to be treated is removed.;SOLUTION: A contaminant removing method of the present invention includes irradiating a rear side end portion and a side surface of a substrate 7 to be treated with a thin-film formed on the surface thereof with directional beams under vacuum.;COPYRIGHT: (C)2009,JPO&INPIT