FILM THICKNESS QUALITY DISCRIMINATION METHOD OF THIN FILM LAYER

摘要

PROBLEM TO BE SOLVED: To provide a method capable of discriminating whether the film thickness of a thin film layer formed on a substrate having a pattern formed on the surface is within a tolerance or not, easily in a short time without using an expensive film thickness measuring device.;SOLUTION: This method for discriminating whether the film thickness of the thin film layer provided on the substrate having the pattern formed on the surface is within the tolerance or not is described as follows: an average spectral reflectance (V₀(λ)) of the substrate before forming the thin film layer is measured by a light beam having a prescribed diameter; the average spectral reflectance (V₁(λ)) of the layer after forming the thin film layer whose film thickness is within the tolerance is measured; a reflection ratio curve using V₁(λ)/V₀(λ) as the ordinate and the wavelength as the abscissa is formed; ridged or grooved wavelengths W_1i to the number of i on the curve are calculated and preserved as reference values; after forming a thin film layer on another substrate, a reflection ratio curve is formed; wavelengths W_2i to the number of i are calculated; and a value operated from W_1i and W_2i to the number of i is compared with a determination reference value, to thereby discriminate the quality of the film thickness.;COPYRIGHT: (C)2009,JPO&INPIT