首页> 外国专利> PULSED ELECTRON BEAM GENERATING DEVICE AND PULSED ELECTRON BEAM FILM DEPOSITION DEVICE

PULSED ELECTRON BEAM GENERATING DEVICE AND PULSED ELECTRON BEAM FILM DEPOSITION DEVICE

机译:脉冲电子束产生装置和脉冲电子束膜沉积装置

摘要

PROBLEM TO BE SOLVED: To provide a pulsed electron beam generating device stably operating for a long period of time, and an electron beam film deposition device using the above device.;SOLUTION: In this pulsed electron beam generating device 8 equipped with a pulsed electron beam generating part 8a to generate pulsed electron beams, and a guide tube 8b forming a hollow tube made of an insulating material, which is connected to the pulsed electron beam generating part 8a to guide the generated electron beam to a target surface, a fin 8c of an insulating material which has a height in the direction perpendicular to the longitudinal direction of the tube is provided on the side of the guide tube 8b so as to make an almost one round around the side of the guide tube.;COPYRIGHT: (C)2009,JPO&INPIT
机译:解决的问题:提供一种能够长时间稳定地工作的脉冲电子束产生装置,以及使用上述装置的电子束膜沉积装置。产生脉冲电子束的电子束产生部分8a,和形成由绝缘材料制成的中空管的导管8b,其连接到脉冲电子束产生部分8a以将产生的电子束引导到目标表面,翅片8c在引导管8b的侧面上设置有在垂直于管的纵向的方向上具有高度的绝缘材料,以使其围绕引导管的侧面几乎成一圈。 )2009,日本特许厅

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