Being the material in order to form resist protecting film formation material charge, and the higher stratum of society

摘要

PROBLEM TO BE SOLVED: To provide a material for forming a resist protective film which simultaneously prevents deterioration in a resist film during liquid immersion lithography using water or other various liquids for liquid immersion lithography and deterioration in the liquid itself for liquid immersion lithography used in a liquid immersion lithography process, does not increase the number of processing steps, and improves the post exposure time delay resistance of the resist film.;SOLUTION: The material for forming a resist protective film contains at least an acrylic polymer having at least a constitutional unit represented by formula (1) (where R₁ is a 1-5C linear or branched alkylene, and R₂ is a 1-15C linear or branched alkyl or a hydrocarbon group having an alicyclic structure) and a solvent.;COPYRIGHT: (C)2006,JPO&NCIPI