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Sputtering apparatus and method of manufacturing flat display device using the sputtering apparatus

机译:溅射装置及使用该溅射装置的平面显示装置的制造方法

摘要

Provided is a sputtering apparatus which can check a short-circuit of a mask during a non-discharge period, the sputtering apparatus including: a substrate support, which is installed inside a chamber and supports a substrate; a target, which includes a target material that is to be deposited on the substrate; a mask, which is spaced apart from the substrate so as to surround the peripheral part of the substrate; a shield, which supports the mask and is connected to ground; an insulating member, which combines the mask and the shield and includes an insulating material; and a short-circuit detecting apparatus for detecting a short-circuit of the mask during a non-discharge period of the sputtering apparatus.
机译:本发明提供一种能够在非放电期间检查掩模的短路的溅射装置,该溅射装置包括:基板支撑体,其被安装在腔室内并支撑基板。靶,其包括将要沉积在基板上的靶材料;掩模,其与基板间隔开以围绕基板的外围部分;支撑面罩并接地的屏蔽层;绝缘构件,其结合了掩模和屏蔽并且包括绝缘材料;短路检测装置,其在溅射装置的非放电期间中检测掩模的短路。

著录项

  • 公开/公告号US2009152103A1

    专利类型

  • 公开/公告日2009-06-18

    原文格式PDF

  • 申请/专利权人 KYOUNG-WON NAM;

    申请/专利号US20080230596

  • 发明设计人 KYOUNG-WON NAM;

    申请日2008-09-02

  • 分类号C23C14/00;

  • 国家 US

  • 入库时间 2022-08-21 19:36:34

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