首页> 外国专利> Spatial Light Modulator Device, Lithographic Apparatus, Display Device, Method of Producing a Light Beam Having a Spatial Light Pattern and Method of Manufacturing a Device

Spatial Light Modulator Device, Lithographic Apparatus, Display Device, Method of Producing a Light Beam Having a Spatial Light Pattern and Method of Manufacturing a Device

机译：空间光调制器装置，光刻设备，显示装置，产生具有空间光图案的光束的方法和制造装置的方法

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摘要

The spatial light modulator device (SLM) for providing a spatial light pattern which is alterable in response to an electric signal comprises a first modulator element (ME1) and a second modulator element (ME2). The first light beam (LB1) processed by the first modulator element (ME1) and the second light beam (LB2) processed by the second modulator element (ME2) can be superimposed for forming the spatial light pattern. In this way a defect in the first modulator element (ME1) can be compensated a corresponding pixel of the second modulator element (ME2). The spatial light pattern provided by the first modulator element (ME1) and the second modulator element (ME2) are complementary and combine to the desired spatial light pattern. The spatial light modulator device (SLM) may be used in a lithography apparatus (LA) or a display device (DD).

机译：用于提供可响应于电信号而变化的空间光图案的空间光调制器装置（SLM）包括第一调制器元件（ME 1 ）和第二调制器元件（ME 2））。由第一调制器元件（ME 1 ）处理的第一光束（LB 1 ）和由第一调制器元件（ME 1 ）处理的第二光束（LB 2 ）可以叠加第二调制器元件（ME 2 ）以形成空间光图案。以此方式，可以补偿第一调制器元件（ME 1 ）中的缺陷，从而补偿第二调制器元件（ME 2 ）的相应像素。由第一调制器元件（ME 1 ）和第二调制器元件（ME 2 ）提供的空间光图案是互补的，并且组合为所需的空间光图案。空间光调制器装置（SLM）可以用在光刻设备（LA）或显示装置（DD）中。 展开▼

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公开/公告号US2008304030A1

专利类型

公开/公告日2008-12-11

原文格式PDF

申请/专利权人 ERIK JAN LOUS;
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申请/专利号US20060914349

发明设计人 ERIK JAN LOUS;
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申请日2006-05-08

分类号G03B27/42;G03B27/54;

国家 US

入库时间 2022-08-21 19:35:27

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