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Synthetic silica having low polarization-induced birefringence, method of making same and lithographic device comprising same
Synthetic silica having low polarization-induced birefringence, method of making same and lithographic device comprising same
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机译:具有低偏振诱导双折射的合成二氧化硅,其制备方法和包括该二氧化硅的光刻设备
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摘要
Disclosed are synthetic silica glass having a low polarization-induced birefringence, process for making the glass and lithography system comprising optical element made of the glass. The silica glass has a polarization-induced birefringence measured at 633 nm of less than about 0.1 nm/cm when subjected to excimer laser pulses at about 193 nm having a fluence of about 40 μJ·cm−2·pulse−1 and a pulse length of about 25 ns for 5×109 pulses.
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