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Method and apparatus for reviewing defect of subject to be inspected

机译:检验被检体缺陷的方法和装置

摘要

Absolute coordinates designate position coordinates of a defect of a calibrating substrate, and inspection coordinates designate position coordinates of the defect of the calibrating substrate detected by an inspection apparatus. A deviation of the inspection coordinates with respect to the absolute coordinates is an error included in the inspection coordinates. When “nonrandom errors” are removed from the inspection coordinates, a “random error” is left in the inspection coordinates. The view size for defect search in a defect reviewing apparatus is set based on the random error. Further, a defect for fine alignment is selected based on the tendency of a detected value of the defect size of the calibrating substrate detected by the inspection apparatus.
机译:绝对坐标表示校准基板的缺陷的位置坐标,检查坐标表示由检查装置检测出的校准基板的缺陷的位置坐标。检查坐标相对于绝对坐标的偏差是检查坐标中包括的误差。当从检查坐标中去除“非随机误差”时,在检查坐标中留下“随机误差”。基于随机误差来设置缺陷检查设备中用于缺陷搜索的视图大小。此外,基于由检查设备检测到的校准基板的缺陷尺寸的检测值的趋势,选择用于精细对准的缺陷。

著录项

  • 公开/公告号US7593564B2

    专利类型

  • 公开/公告日2009-09-22

    原文格式PDF

  • 申请/专利权人 KENJI OBARA;KAZUO AOKI;

    申请/专利号US20050272897

  • 发明设计人 KENJI OBARA;KAZUO AOKI;

    申请日2005-11-15

  • 分类号G06K9/00;

  • 国家 US

  • 入库时间 2022-08-21 19:32:11

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