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Wafer level alignment structures using subwavelength grating polarizers
Wafer level alignment structures using subwavelength grating polarizers
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机译:使用亚波长光栅偏振片的晶圆级对准结构
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摘要
In one embodiment, a wafer alignment system, comprises a radiation source to generate radiation, a radiation directing assembly to direct at least a portion of the radiation onto a surface of a wafer, the radiation having a polarization state, an optical analyzer to collect at least a portion of the radiation reflected from the wafer, the wafer including at least a first region having a first grating pattern oriented in a first direction and at least a second region having a second grating pattern oriented in a second direction, different from the first direction.
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