首页> 外国专利> N-type ohmic electrode for n-type group III nitride semiconductor, semiconductor light-emitting device with the electrode, and method for forming n-type ohmic electrode

N-type ohmic electrode for n-type group III nitride semiconductor, semiconductor light-emitting device with the electrode, and method for forming n-type ohmic electrode

机译:用于n型III族氮化物半导体的n型欧姆电极,具有该电极的半导体发光器件以及形成n型欧姆电极的方法

摘要

The present invention provides a constitution of n-type ohmic electrode suitable for n-type group III nitride semiconductor, and a forming method thereof for providing low contact resistivity. The n-type ohmic electrode is provided to comprise an alloy of aluminum and lanthanum or comprises lanthanum at the junction interface with the n-type group III nitride semiconductor. The method comprising forming a lanthanum-aluminum alloy layer at 300° C. or less to form an n-type ohmic electrode enriched in lanthanum at the junction interface.
机译:本发明提供了适用于n型III族氮化物半导体的n型欧姆电极的构造及其用于提供低接触电阻率的形成方法。提供n型欧姆电极以包括铝和镧的合金,或者在与n型III族氮化物半导体的接合界面处包括镧。该方法包括在300℃或更低的温度下形成镧铝合金层,以在结界面处形成富含镧的n型欧姆电极。

著录项

  • 公开/公告号US7598593B2

    专利类型

  • 公开/公告日2009-10-06

    原文格式PDF

  • 申请/专利权人 TAKASHI UDAGAWA;

    申请/专利号US20040561438

  • 发明设计人 TAKASHI UDAGAWA;

    申请日2004-07-16

  • 分类号H01L23/58;H01L29/06;H01G5/06;

  • 国家 US

  • 入库时间 2022-08-21 19:30:41

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