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Evaluation method and fabrication method of optical element having multilayer film, exposure apparatus having the multilayer film, and device fabrication method
Evaluation method and fabrication method of optical element having multilayer film, exposure apparatus having the multilayer film, and device fabrication method
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机译:具有多层膜的光学元件的评价方法和制造方法,具有多层膜的曝光装置以及器件的制造方法
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摘要
A fabrication method of an optical element having a multilayer film includes the steps of forming a multilayer film on a substrate, measuring a secondary radiation radiated from the multilayer film when a light with a wavelength of 2 to 40 nm is irradiated to the multilayer film, determining a phase difference between the light irradiated to the multilayer film and the light reflected from the multilayer film based on a measurement result of the measuring step, and modifying the multilayer film based on the determined phase difference.
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