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Top anti-reflective coating polymer, its preparation method and top anti-reflective coating composition comprising the same
Top anti-reflective coating polymer, its preparation method and top anti-reflective coating composition comprising the same
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机译:顶部抗反射涂料聚合物,其制备方法和包含该聚合物的顶部抗反射涂料组合物
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摘要
Disclosed herein is a top anti-reflective coating polymer represented by Formula 1, below:; wherein R1 and R2 are independently hydrogen, fluoro, methyl or fluoromethyl; R3 is a C1-10 hydrocarbon or a C1-10 hydrocarbon in which the hydrogen atoms are partly replaced by fluorine atoms; and a, b and c, representing the mole fraction of each monomer, are in the range between 0.05 and 0.9. Because a top anti-reflective coating formed using the anti-reflective coating polymer of Formula 1 is not soluble in water, it can be applied to immersion lithography using water as a medium for a light source. In addition, because the top anti-reflective coating can reduce the reflectance from an underlying layer, the uniformity of CD is improved, thus enabling the formation of an ultra fine pattern.
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机译:本文公开了由下式1表示的顶部抗反射涂层聚合物: 化学>其中R1和R2独立地是氢,氟,甲基或氟甲基; R 3为碳原子数为1〜10的烃或氢原子被氟原子部分取代的碳数为1〜10的烃。代表每种单体的摩尔分数的a,b和c在0.05和0.9之间的范围内。因为使用式1的抗反射涂层聚合物形成的顶部抗反射涂层不溶于水,所以可以将其用作使用水作为光源的浸没式光刻技术。另外,因为顶部抗反射涂层可以降低来自下层的反射率,所以改善了CD的均匀性,从而使得能够形成超精细图案。
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