首页> 外国专利> Substrate for maintaining rock environment contaminated with halogenated hydrocarbons using in-situ reductive dechlorination method, substrate application method and apparatus for making the same

Substrate for maintaining rock environment contaminated with halogenated hydrocarbons using in-situ reductive dechlorination method, substrate application method and apparatus for making the same

机译:用原位还原脱氯法保持被卤代烃污染的岩石环境的基质,基质的涂布方法及其制造装置

摘要

substrate for halogenated hydrocarbons remediation contaminated ground environment by reductive dechlorace in-situ contains 100 weight parts of the by-product potra low energyvinu00e1rsku00e9ho industrious and 1 to 3 weight parts of the high-energy by-product potravinu00e1rsku00e9ho industrious.while low - energy potravinu00e1rsku00e9ho there is by-product of whey and high - energy by-product potravinu00e1rsku00e9ho there are distilling dregs and / or repnu00e1 molasses.the substrate is in a quantity corresponding to the target content gives a total organic carbon toc in injektu00e1u017enu00edm borehole 600 to 1200 mg / l, the corresponding concentration of 40 to 80 mg / l of toc at 1 mg / l of halogenoother sloucenin in contaminated underground water.
机译:原位用于还原性除氯修复卤化烃污染的地面的基质,其中包含100重量份的低能量副产品potravin和1到3重量份的高能副产品potravin u00e1rsk u00e9ho低能量的potravin u00e1rsk u00e9ho有乳清的副产品,而高能量的副产品potravin 或repn u00 9糖蜜。底物的量相应达到目标含量,则井眼中的总有机碳toc达到600至1200 mg / l,相应的浓度为40-80 mg / l,1 mg / l卤代其他松节菌素的浓度受污染的地下水。

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