PHOTOSENSITIVE ELEMENT, PHOTOSENSITIVE ELEMENT ROLL, PROCESS FOR THE PREPARATION OF RESIST PATTERN USING THE SAME, RESIST PATTERN, RESIST PATTERN LAMINATED BASE PLATE, PROCESS FOR THE PREPARATION OF WIRING PATTERN AND WIRING PATTERN

摘要

THERE ARE DISCLOSED A PHOTOSENSITIVE ELEMENT COMPRISING A SUPPORT FILM WHICH COMPRISES A BIAXIALLY ORIENTED POLYESTER FILM AND A RESIN LAYER CONTAINING FINE PARTICLES ON ONE SURFACE OF THE FILM , AND A LAYER OF A PHOTOSENSITIVE RESIN COMPOSITION FORMED ON THE OPPOSITE SURFACE OF THE SUPPORT FILM TO WHICH THE RESIN LAYER IS FORMED , WHEREIN SAID PHOTOSENSITIVE RESIN COMPOSITION COMPRISES @(A) A BINDER POLYMER HAVING A CARBOXYL GROUP ,@(B) A PHOTOPOLYMERIZABLE COMPOUND HAVING AT LEAST ONE POLYMERIZABLE ETHYLENICALLY UNSATURATED GROUP IN THE MOLECULE ,AND @(C) PHOTOPOLYMERIZATION INITIATOR,@A PHOTOSENSITIVE ELEMENT ROLL , A PROCESS FOR THE PREPARATION A OF A RESIST PATTERN USING THE SAME , THE RESIST PATTERN, A RESIST PATTERN-LAMINATED BASE PLATE , A PROCESS FOR THE PREPARATION OF A WIRING PATTERN AND THE WIRING PATTERN.