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method and device for plasmadotierung and ionenimplantierung in an integrated behandlungssystem
method and device for plasmadotierung and ionenimplantierung in an integrated behandlungssystem
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机译:一体化手肺系统中血浆去离子和离子植入的方法和设备
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摘要
Methods and apparatus are provided for plasma doping and ion implantation in an integrated processing system. The apparatus includes a process chamber, a beamline ion implant module for generating an ion beam and directing the ion beam into the process chamber, a plasma doping module including a plasma doping chamber that is accessible from the process chamber, and a wafer positioner. The positioner positions a semiconductor wafer in the path of the ion beam in a beamline implant mode and positions the semiconductor wafer in the plasma doping chamber in a plasma doping mode.
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