首页>
外国专利>
SYSTEM AND METHOD FOR AUTOMATIC ELIMINATION OF ELECTROMIGRATION AND SELF HEAT VIOLATIONS DURING CONSTRUCTION OF A MASK LAYOUT BLOCK, MAINTAINING PROCESS DESIGN RULES AND LAYOUT CONNECTIVITY.
SYSTEM AND METHOD FOR AUTOMATIC ELIMINATION OF ELECTROMIGRATION AND SELF HEAT VIOLATIONS DURING CONSTRUCTION OF A MASK LAYOUT BLOCK, MAINTAINING PROCESS DESIGN RULES AND LAYOUT CONNECTIVITY.
展开▼
机译:在屏蔽布局块的构建,过程设计规则和布局连接性的构建过程中自动消除电和自热违规的系统和方法。
展开▼
页面导航
摘要
著录项
相似文献
摘要
A system and method for automatic elimination of electromigration (EM) and self heat (SH) violations during construction of a mask layout block, maintaining the process design rules (DRC Clean) and layout connectivity (LVS Clean) correctness, are disclosed. The method includes analyzing a selected polygon for space, width and length, in a mask layout block and obtaining one or more electromigration and/or self heat rules associated with the polygon from a technology and an external constraints file. The method also includes analyzing contacts and VIA's for amount and location in order to comply with electromigration and self heat rules. The method provides a violation marker associated with the selected position for the polygon that graphically represents a width, space, length and other polygon's physical characteristics within the mask layout block where the selected polygon complies with the electromigration and/or self heat violation. The method and system also provides an option to automatically correct the electromigration (EM) and self heat violation of the mask layout block, maintaining the process design rules (DRC Clean) and layout connectivity (LVS Clean) correctness.
展开▼