SYSTEM AND METHOD FOR AUTOMATIC ELIMINATION OF ELECTROMIGRATION AND SELF HEAT VIOLATIONS OF A MASK LAYOUT BLOCK, MAINTAINING THE PROCESS DESIGN RULES (DRC CLEAN) AND LAYOUT CONNECTIVITY (LVS CLEAN) CORRECTNESS.

摘要

A system and method for automatic correction of electromigration (EM) and self heat (SH) violations of a mask layout block, maintaining the process design rules (DRC Clean) and layout connectivity (LVS Clean) correctness are disclosed. The method includes analyzing polygons for space, width and length, in a mask layout block and obtaining one or more electromigration and/or self heat rules associated with the polygon from a technology and an external constraints file. The system automatically corrects all EM and/or SH violations if found, maintaining the process design rules (DRC Clean) and layout connectivity (LVS Clean) correctness. The method also includes analysis and automatic correction of contacts and VIA's according to amount and location in order to comply with electromigration and self heat rules as taken from technology or external constraints file. The method provides a violation marker associated with the selected position for the polygon that graphically represents a width, space, length violation. The method and system works on GDSII format files and on industry standards layout editor's database.