首页> 外国专利> REGENERATING PROCESS AND REGENERATING SYSTEM TO REGENERATE WASTE SLURRY FROM SEMICONDUCTOR WAFER MANUFACTURING PROCESS

REGENERATING PROCESS AND REGENERATING SYSTEM TO REGENERATE WASTE SLURRY FROM SEMICONDUCTOR WAFER MANUFACTURING PROCESS

机译:再生工艺和再生系统以再生半导体晶圆制造工艺中的废渣

摘要

There are provided a method and a system for regenerating a waste slurry which is disused after a slurry has been used to raise the cutting efficiency in a process of fabricating various wafers, such as semiconductor wafers, solar wafers and others. The method for regenerating the waste slurry made during various wafer fabrication processes comprises: a waste slurry mixing step (S10) of mixing a waste slurry, to disperse abrasives and chips contained in the waste slurry; a dispersing step (S20) of dispersing the waste slurry mixed in the mixing step, by using ultrasonic waves; a centrifuging step (S30) of extracting abrasive solids from the waste slurry dispersed in the dispersing step, by using a centrifuge; an abrasive solid mixing step (S40) of mixing the abrasive solids extracted in the centrifuging step; an abrasive purifying step (S50) of purifying the abrasives mixed in the mixing step, by using an abrasive purifier; a drying step (S60) of removing moisture of the abrasive solids purified in the abrasive purifying step; and a regenerating step (S70) of processing the abrasives dried in the drying step, to be in a powder state. The system for regenerating a waste slurry made during various wafer fabrication processes comprises: a waste slurry mixer (10) for mixing a waste slurry being put into the mixer (10), to scatter a precipitate composed of abrasives and chips included in the waste slurry; a particle disperser (20) for dispersing the mixed waste slurry flowing from the mixer (10), by using ultrasonic waves; a centrifuge (30) for centrifuging the waste slurry dispersed by the particle disperser (20), to extract the abrasives; a number of sub-tanks (40) for storing the abrasives extracted by the centrifuge (30); a number of mixers (50) for mixing the abrasives of the sub-tanks (40); a number of abrasive purifiers (60), each including a cleaning device installed in the centrifuge, for removing impurities remaining on the abrasives by receiving the abrasives supplied from the mixers (50); a drier (70) for drying the abrasives purified by the abrasive purifiers (60); and an abrasive powder maker (80) for regenerating the abrasives dried by the drier (70).
机译:提供了一种用于再生废浆料的方法和系统,该废浆料在已经被使用以提高制造诸如半导体晶片,太阳能晶片等的各种晶片的过程中的切割效率之后被废弃。在各种晶片制造过程中产生的废浆的再生方法包括:废浆混合步骤(S10),其混合废浆以分散废浆中包含的研磨剂和碎屑;分散步骤(S20),利用超声波将在混合步骤中混合的废浆料分散。离心步骤(S30),通过使用离心机从分散在分散步骤中的废浆料中提取磨料固体;研磨固体混合步骤(S40),其将在离心步骤中提取的研磨固体混合;研磨剂净化步骤(S50),通过使用研磨剂净化器来纯化在混合步骤中混合的研磨剂;干燥步骤(S60),其去除在磨料纯化步骤中纯化的磨料固体的水分;再生步骤(S70)将在干燥步骤中干燥的磨料加工成粉末状态。用于使在各种晶片制造过程中制造的废浆料再生的系统包括:废浆料混合器(10),用于混合放入混合器(10)中的废浆料,以分散由废浆料中包括的磨料和碎屑组成的沉淀物。 ;颗粒分散器(20),用于通过超声波分散从混合器(10)流出的混合废浆液;离心机(30),其对由颗粒分散器(20)分散的废浆进行离心,以提取磨料;多个子容器(40),用于存储由离心机(30)提取的磨料。多个混合器(50),用于混合子容器(40)的磨料;多个磨料净化器(60),每个包括安装在离心机中的清洁装置,用于通过接收从混合器(50)供应的磨料来去除残留在磨料上的杂质;干燥器(70),用于干燥由磨料净化器(60)纯化的磨料;研磨剂制造器(80),其用于使由干燥器(70)干燥的研磨剂再生。

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