SiO DEPOSITION MATERIAL, Si POWDER FOR SiO RAW MATERIAL, AND METHOD FOR PRODUCING SiO

摘要

A silicon monoxide or a silicon monoxide vapor deposition material is characterized in that a hydrogen gas content is not lower than 120 ppm, and a silicon monoxide vapor deposition material is characterized in that the hydrogen gas content is not lower than 150 ppm. A film deposition rate is increased when the silicon monoxide is deposited on a substrate, so that a silicon monoxide deposited film can efficiently be formed. A sublimation rate can be increased in producing the silicon monoxide by setting the hydrogen gas content of the raw material silicon powders to 30 ppm or more, so that the silicon monoxide can efficiently be produced at low cost. Therefore, the silicon monoxide producing method of the present invention can widely be applied as a method for producing vapor deposition materials for packaging materials having transparency and barrier properties which are used for foods, medical products, medicinal products, and the like or vapor deposition materials for lithium battery electrode materials having silicon monoxide deposited films.