首页>
外国专利>
PATTERNING NANOWIRES ON SURFACES FOR FABRICATING NANOSCALE ELECTRONIC DEVICES
PATTERNING NANOWIRES ON SURFACES FOR FABRICATING NANOSCALE ELECTRONIC DEVICES
展开▼
机译:在用于制造纳米尺度电子设备的表面上绘制纳米线
展开▼
页面导航
摘要
著录项
相似文献
摘要
The present invention relates to a method of depositing nanowires on the surface of a substrate, comprising the steps of: contacting defined regions of the substrate with at least one compound (C1) capable of binding to the surface of the substrate and of binding the nanowires to provide a pattern of binding sites on the surface of the substrate and/or contacting defined regions of the substrate with at least one compound (C2) capable of binding to the surface of the substrate and preventing the binding of nanowires to provide a pattern of non-binding sites on the surface of the substrate, and contacting the surface of the substrate with a suspension of nanowires in a liquid medium to enable at least a portion of the applied nanowires to bind to at least a portion of the surface of the substrate covered with (C1) and/or not covered with (C2).
展开▼