首页> 外国专利> METHOD FOR CONTROLLED FORMATION OF THE RESISTIVE SWITCHING MATERIAL IN A RESISTIVE SWITCHING DEVICE AND DEVICES OBTAINED THEREOF

METHOD FOR CONTROLLED FORMATION OF THE RESISTIVE SWITCHING MATERIAL IN A RESISTIVE SWITCHING DEVICE AND DEVICES OBTAINED THEREOF

机译:电阻开关装置中电阻开关材料的可控形成方法及其获得的装置

摘要

The present disclosure provides a method for controlled formation of the resistive switching layer in a resistive switching device. The method comprises providing a substrate (2) comprising the bottom electrode (10), providing on the substrate a dielectric layer (4) comprising a recess (7) containing the metal for forming the resistive layer (11), providing on the substrate a dielectric layer (5) comprising an opening (8) exposing the metal of the recess, and forming the resistive layer in the recess and in the opening.
机译:本公开提供了一种用于在电阻开关装置中控制形成电阻开关层的方法。该方法包括:提供包括底部电极(10)的衬底(2),在衬底上提供介电层(4),该介电层(4)包括包含用于形成电阻层(11)的金属的凹槽(7),在衬底上提供介电层(5)包括开口(8),该开口暴露出凹槽的金属,并在凹槽和开口中形成电阻层。

著录项

相似文献

  • 专利
  • 外文文献
  • 中文文献
获取专利

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号