首页> 外国专利> HOLDING JIG, SEMICONDUCTOR WAFER GRINDING METHOD, SEMICONDUCTOR WAFER PROTECTING STRUCTURE, SEMICONDUCTOR WAFER GRINDING METHOD USING SUCH SEMICONDUCTOR WAFER PROTECTING STRUCTURE, AND SEMICONDUCTOR CHIP MANUFACTURING METHOD

HOLDING JIG, SEMICONDUCTOR WAFER GRINDING METHOD, SEMICONDUCTOR WAFER PROTECTING STRUCTURE, SEMICONDUCTOR WAFER GRINDING METHOD USING SUCH SEMICONDUCTOR WAFER PROTECTING STRUCTURE, AND SEMICONDUCTOR CHIP MANUFACTURING METHOD

机译:保持夹具,半导体晶片研磨方法,半导体晶片保护结构,使用这种半导体晶片保护结构的半导体晶片研磨方法以及半导体芯片制造方法

摘要

Provided are a holding jig which can eliminate troubles due to use of a protection sheet, a semiconductor wafer grinding method, a semiconductor wafer protecting structure, a semiconductor wafer grinding method using such semiconductor wafer protecting structure, and semiconductor chip manufacturing method. A holding jig (20) for holding a semiconductor wafer (W) is composed of a recessed hole (22) formed on the surface of a substrate (21); a plurality of supporting protrusions (23) arranged to protrude from the bottom surface of the recessed hole (22); a deformable adhesive film (24), which covers the recessed hole (22) by being supported by the supporting protrusions (23) and adhesively and removably holds the semiconductor wafer (W); and an exhaust path (25) for leading the air inside the recessed hole (22) covered with the adhesive film (24) to the external. ® KIPO & WIPO 2009
机译:提供一种能够消除由于使用保护片而引起的麻烦的保持夹具,半导体晶片研磨方法,半导体晶片保护结构,使用这种半导体晶片保护结构的半导体晶片研磨方法以及半导体芯片制造方法。用于保持半导体晶片(W)的保持夹具(20)由在基板(21)的表面上形成的凹孔(22)构成。从凹孔(22)的底面突出设置有多个支撑突起(23)。可变形的粘合膜(24),其通过由支撑突起(23)支撑而覆盖凹孔(22),并且以可粘接方式和可移除方式保持半导体晶片(W);排气路径(25)将覆盖有粘接膜(24)的凹孔(22)内的空气向外部引导。 ®KIPO和WIPO 2009

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