首页> 外国专利> GRAY TON MASK, METHOD FOR MANUFACTURING OF GRAY TON MASK, METHOD FOR MANUFACTURING OF PHASE MASK USING GRAY TON MASK, PHASE MASK OF MANUFACTURED FOR GRAY TON MASK AND MANUFACTURED PHASE MASK USING GRAY TON MASK

GRAY TON MASK, METHOD FOR MANUFACTURING OF GRAY TON MASK, METHOD FOR MANUFACTURING OF PHASE MASK USING GRAY TON MASK, PHASE MASK OF MANUFACTURED FOR GRAY TON MASK AND MANUFACTURED PHASE MASK USING GRAY TON MASK

机译:灰口罩,灰口罩的制造方法,使用灰口罩的相罩的制造方法,制造灰口罩的相罩和使用灰口罩的制造的相罩

摘要

A gray-tone mask, a manufacturing method of the gray-tone mask, and a phase mask manufacturing method using the gray-tone mask and the phase mask manufactured by the gray-tone mask are provided to resolve or correct the problem of the optical system by using a transparent substrate having transmitting films and blocking films. A gray-tone mask(10) comprises a transparent substrate(12), transmitting films(14a, 14b) and a barrier layer(16). The transmitting film and the barrier layer are formed on one surface of the transparent substrate. The transmitting film can have the exposure pattern having the different light transmission. The barrier layer can have the light-shield pattern which does not overlap with the transmitting film. The phase mask comprises the transparency mask substrate and the phase level layer. The phase level layers are formed on one surface of the transparency mask substrate. The phase level layers can be formed by transferring the transmitting layer and the barrier layer to the photoresist.
机译:提供一种灰度掩模,该灰度掩模的制造方法以及使用该灰度掩模和由该灰度掩模制造的相位掩模的相位掩模的制造方法,以解决或校正光学问题。通过使用具有透射膜和阻挡膜的透明基板的系统。灰阶掩模(10)包括透明基板(12),透射膜(14a,14b)和阻挡层(16)。透射膜和阻挡层形成在透明基板的一个表面上。透射膜可以具有具有不同透光率的曝光图案。阻挡层可以具有不与透射膜重叠的遮光图案。相位掩模包括透明掩模基板和相位水平层。在透明掩模基板的一个表面上形成相层。可以通过将透射层和阻挡层转移至光致抗蚀剂来形成相水平层。

著录项

  • 公开/公告号KR20090002583A

    专利类型

  • 公开/公告日2009-01-09

    原文格式PDF

  • 申请/专利权人 DAEWOO ELECTRONICS CORPORATION;

    申请/专利号KR20070066060

  • 发明设计人 KIM KYOUNG SEOK;

    申请日2007-07-02

  • 分类号H01L21/027;G03F1;

  • 国家 KR

  • 入库时间 2022-08-21 19:14:13

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