OPTIMIZING SELECTED VARIABLES OF AN OPTICAL METROLOGY SYSTEM

摘要

A method for optimizing a selection variable of an optical metrology system is provided to optimize an optical metrology model of a first patterned structure by using a floating profile, a material refraction parameter, and a measurement facility parameter by using at least measured diffraction signal out of the first patterned structure. A first manufacture cluster(916) processes a wafer. A wafer has a first patterned structure and a first non-patterned structure. A metrology cluster(912) measures the first patterned structure and the non-patterned structure out of the diffraction signal. A metrology model optimizer(904) optimizes the optic metrology model of the first patterned structure. A real time profile estimator(918) generates the output including a lower film thickness, a critical dimension, and a profile of the first patterned structure.