PHOTO RESIST PROVISION APPARATUS EQUIPPED FITTING FOR MEASURING VISCOSITY OF PHOTO RESIST AND METHOD FOR MEASURING VISCOSITY OF PHOTO RESIST

摘要

A photo resist provision apparatus equipped fitting for measuring the viscosity of a photo resist and a method for measuring viscosity of photo resist are provided to minimize the loss of photo sensitive solution in exchanging a filter by measuring the viscosity of photo sensitive solution simply. A vibration generator(50) is formed in a filter(31) and generates vibration, and a vibration sensor(61) detects the vibration of the vibration generator. A vibration sensing sensor controller(62) converts the detected vibration into an electric signal, and a database(64) stores a frequency corresponding to the viscosity as a data for a photolithography process. A central processing unit(63) compares the electrical signal and stored vibration frequency, and a controller(65) controls a photo sensitive solution supply system(1) based on a comparison result.