ELECTRON BEAM LITHOGRAPHY APPARATUS FOR MANUFACTURING A SEMICONDUCTOR DEVICE CAPABLE OF IMPROVING MASS PRODUCTABILITY BY REDUCING AN EXPOSURE TIME

摘要

PURPOSE: An electron beam lithography apparatus for manufacturing a semiconductor device is provided to expose two mask or both sides of a mask inside one device without problem due to vibration by arranging an electron beam column in both sides of a chamber.;CONSTITUTION: An electron beam lithography apparatus for manufacturing a semiconductor device includes a chamber(300), a stage(320), and an electron beam column(100,200). A mask exposure is performed in the chamber. The stage is positioned inside the chamber, and supports the mask. The electron beam column irradiates an electron beam to the mask loaded inside the chamber, and is arranged in both sides of the chamber.;COPYRIGHT KIPO 2010