首页> 外国专利> Pipe structure, alignment apparatus, electron beam lithography apparatus, exposure apparatus, exposure apparatus maintenance method, semiconductor device manufacturing method, and semiconductor manufacturing factory

Pipe structure, alignment apparatus, electron beam lithography apparatus, exposure apparatus, exposure apparatus maintenance method, semiconductor device manufacturing method, and semiconductor manufacturing factory

机译:管结构,对准设备,电子束光刻设备,曝光设备,曝光设备维护方法,半导体器件制造方法和半导体制造工厂

摘要

A pipe connected to a stage serving as a movable member arranged in a vacuum chamber has a double pipe structure constituted by a resin inner pipe and a resin outer pipe which covers the inner pipe including its surrounding space. The space between the inner pipe and the outer pipe is connected to a vacuum pump serving as an exhaust means. The space in the pipe is kept in vacuum by the vacuum pump.
机译:连接到用作布置在真空室中的可移动构件的平台的管具有由树脂内管和树脂外管构成的双管结构,该树脂外管覆盖包括其周围空间的内管。内管和外管之间的空间连接到用作排气装置的真空泵。管道中的空间通过真空泵保持真空。

著录项

  • 公开/公告号US2002000029A1

    专利类型

  • 公开/公告日2002-01-03

    原文格式PDF

  • 申请/专利权人 EMOTO KEIJI;

    申请/专利号US20010833766

  • 发明设计人 KEIJI EMOTO;

    申请日2001-04-13

  • 分类号G06F19/00;H01L21/00;B23K9/16;H01L21/64;F16L9/14;

  • 国家 US

  • 入库时间 2022-08-22 00:51:06

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