首页>
外国专利>
METHOD FOR MONITORING A TILT OF A POLE AXIS OF OFF-AXIS ILLUMINATION CAPABLE OF EXCLUDING AN OPERATION BREAK OF AN EXPOSURE DEVICE
METHOD FOR MONITORING A TILT OF A POLE AXIS OF OFF-AXIS ILLUMINATION CAPABLE OF EXCLUDING AN OPERATION BREAK OF AN EXPOSURE DEVICE
展开▼
机译:用于监测能够排除曝光设备的操作中断的轴外照明的极轴倾斜的方法
展开▼
页面导航
摘要
著录项
相似文献
摘要
PURPOSE: A method for monitoring a tilt of a pole axis of off-axis illumination is provided to continuously monitor a tilt degree of a pole axis by confirming a position of a pole of off-axis illumination.;CONSTITUTION: Monitoring patterns are formed on a photo mask as mask patterns. Wafer patterns(500) in which the monitoring patterns are transferred are formed on a wafer by performing an exposure process using the photo mask. A direction for connecting center positions of each wafer pattern is extracted into a pole axis direction of off-axis illumination applied to exposure. A tilt degree of the pole axis of the off-axis illumination applied to the exposure is extracted from the direction of the extracted pole axis.;COPYRIGHT KIPO 2010
展开▼