首页> 外国专利> Quasi substrate for e.g. surface emitting semiconductor laser, has buffer layer sequence provided with layer pairs from semiconductor layers with indium portions that increase from one layer pair to anothe layer pair based on substrate

Quasi substrate for e.g. surface emitting semiconductor laser, has buffer layer sequence provided with layer pairs from semiconductor layers with indium portions that increase from one layer pair to anothe layer pair based on substrate

机译:准底物,例如表面发射半导体激光器,具有缓冲层序列,该缓冲层序列具有半导体层和铟部分的层对,铟层基于基板从一层对增加到另一层

摘要

The substrate has a buffer layer sequence (2) provided with multitude of layer pairs (9a-9c) from semiconductor layers (3-8) respectively made of indium gallium arsenide. The layers (4, 6, 8) are applied on the layers (3, 5, 7).Indium portions of the layers (3-8) increase from one layer pair to another layer pair based on a substrate (1).The indium portion of the layers (4, 6, 8) in each pair is smaller than the indium portions of the layers (3, 5, 7). The substrate is made of gallium arsenide. The semiconductor layer (8) of the buffer layer sequence is provided with a high lattice constant. An independent claim is also included for an opto-electronic element comprising an radiation-emitting active zone that emits radiation with a wavelength of 1200 nanometer.
机译:衬底具有缓冲层序列(2),该缓冲层序列(2)具有分别来自由砷化铟镓制成的半导体层(3-8)的多个层对(9a-9c)。将层(4、6、8)施加在层(3、5、7)上。基于基板(1),层(3-8)的铟部分从一层对增加到另一层。每对中的层(4、6、8)的铟部分小于层(3、5、7)的铟部分。基板由砷化镓制成。缓冲层序列的半导体层(8)具有高晶格常数。对于光电元件还包括独立权利要求,该光电元件包括​​发射辐射的有源区,该有源区发射波长为1200纳米的辐射。

著录项

  • 公开/公告号DE102007046752A1

    专利类型

  • 公开/公告日2009-04-02

    原文格式PDF

  • 申请/专利权人 OSRAM OPTO SEMICONDUCTORS GMBH;

    申请/专利号DE20071046752

  • 发明设计人 SUNDGREN PETRUS;STREUBEL KLAUS;

    申请日2007-09-28

  • 分类号H01L33;

  • 国家 DE

  • 入库时间 2022-08-21 19:09:37

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