Imaging optics, a projection exposure system for microlithography with such an imaging optical system and method for producing a microstructured component with such a projection exposure system

摘要

An embodiment of an imaging optical system (8) has, as the beam-guiding optical components made of mirrors. The imaging optical system (8) forms at least one object field (4, 5) in at least an object plane (6) in at least one image frame (9, 10) in at least one image plane (11) from. In the case of the imaging optics (8) are arranged two spatially separated from one another object fields (4, 5), which likewise arranged spatially separated from one another two frames (9, 10) are associated with. The result is an imaging optical system, the flexibility of use is increased.