Imaging optical system, as well as a projection exposure system for microlithography with such an optical imaging system

摘要

An imaging optical system (7) has a plurality of mirrors (m1 to m6). These form an object (4) in an object plane (5) in an image field (8) in an image plane (9) from. In the case of the imaging optics (7) is a ratio of a maximum angle of incidence of imaging (15) with reflecting surfaces of the mirror (m1 to m6) and a two-sided numerical aperture of the imaging optical system (7) is smaller than 33,8°. The result is an imaging optical system, the good preconditions for a reflective coating of the mirror, with the low reflection losses for imaging during the passage through the imaging optical system is in particular also in the case of wavelengths in the euv - range of less than 10 nm can be realized.