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Thermally highly loadable low-E-layer system for coating transparent flat substrates such as glass panes, comprises two silver functional layers, zinc oxide layers, metallic nickel-chromium blocker layers, and dielectric layers
Thermally highly loadable low-E-layer system for coating transparent flat substrates such as glass panes, comprises two silver functional layers, zinc oxide layers, metallic nickel-chromium blocker layers, and dielectric layers
The thermally highly loadable low-E-layer system comprises two silver functional layers, zinc oxide layers directly arranged below the silver layers, metallic nickel-chromium blocker layers directly arranged on the silver layers, and dielectric layers arranged above the blocker layers. The dielectric layer arranged above the upper blocker layer consists of a zinc oxide partial layer, a nickel chromium oxide partial layer and a silicon nitride partial layer in sequence. A titanium oxide layer is directly arranged on a substrate surface and has a thickness of less than 5 nm. The thermally highly loadable low-E-layer system comprises two silver functional layers, zinc oxide layers directly arranged below the silver layers, metallic nickel-chromium blocker layers directly arranged on the silver layers, and dielectric layers arranged above the blocker layers. The dielectric layer arranged above the upper blocker layer consists of a zinc oxide partial layer, a nickel chromium oxide partial layer and a silicon nitride partial layer in sequence. A titanium oxide layer is directly arranged on a substrate surface and has a thickness of less than 5 nm. A further layer is arranged as a covering layer above the silicon nitride layer. The covering layer has a thickness of less than 2 nm. The zinc oxide layer is arranged on the metallic nickel-chromium blocker layers. The dielectric layer arranged on the lower blocker layer consists of a zinc oxide partial layer and a silicon nitride partial layer.
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