Transfer sample producing method for transfer mechanism i.e. photolithographic mask, involves optimizing transfer sample such that deviation of structure i.e. integrated circuit, is reduced by reference structure

摘要

The method involves producing a transfer sample (210) for a transfer mechanism on the basis of a reference sample (110), where the transfer mechanism transfers the transfer sample on a substrate for producing a structure i.e. integrated circuit. Another reference sample (120) with a reference structure (121) is indirectly produced on the substrate, where the reference structure serves as parameter for another structure. The transfer sample is optimized such that deviation of the former structure is reduced by another reference structure (111). Independent claims are also included for the following: (1) a method for manufacturing a photolithographic mask (2) a device for producing an optimized transfer sample for a transfer mechanism (3) a system for manufacturing a transfer mechanism (4) a data medium comprising a set of instructions for performing a method for producing an optimized transfer sample for a transfer mechanism.