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Ferromagnetic room temperature - semiconductors and plasma assisted molecular beam epitaxy, such as a method for its production

机译:铁磁室温-半导体和等离子体辅助分子束外延,例如其生产方法

摘要

A 3 group - 5 group compound ferromagnetic semiconductor, comprising one material 'A' selected from the group of Ga, Al and In and one material 'B' selected from the group consisting of N and P, wherein one material 'C' selected from the group consisting of Mn, Mg, Co, Fe, Ni, Cr and V is doped as a material for substituting the material 'A', the compound semiconductor has a single phase as a whole. The ferromagnetic semiconductor can be fabricated by a plasma-enhance molecular beam epitaxy growing method and since it shows the ferromagnetic characteristics at a room temperature, it can be applied as various spin electron devices. IMAGE
机译:3-5组化合物铁磁半导体,包括选自Ga,Al和In的一种材料“ A”和选自N和P的一种材料“ B”,其中一种材料“ C”选自Ga,Al和In。如果将由Mn,Mg,Co,Fe,Ni,Cr和V组成的组掺杂为材料来替代材料“ A”,则化合物半导体整体上具有单相。可以通过等离子增强分子束外延生长方法来制造铁磁半导体,并且由于其在室温下显示出铁磁特性,因此可以用作各种自旋电子器件。 <图像>

著录项

  • 公开/公告号DE60320191T2

    专利类型

  • 公开/公告日2009-06-25

    原文格式PDF

  • 申请/专利权人

    申请/专利号DE2003620191T

  • 发明设计人

    申请日2003-01-31

  • 分类号H01F1/40;H01F10/193;H01F41/30;

  • 国家 DE

  • 入库时间 2022-08-21 19:07:47

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