首页> 外国专利> An apparatus for producing a non-monocrystalline semiconductor thin film, a production method for a non-monocrystalline semiconductor thin film and a production method for a photovoltaic device

An apparatus for producing a non-monocrystalline semiconductor thin film, a production method for a non-monocrystalline semiconductor thin film and a production method for a photovoltaic device

机译:用于制造非单晶半导体薄膜的设备,用于非单晶半导体薄膜的制造方法和用于光伏器件的制造方法

摘要

Provided are an apparatus of forming a non-single-crystal semiconductor thin film comprising a film deposition chamber having a film-forming space surrounded by a film deposition chamber wall and a beltlike substrate, and an external chamber surrounding the deposition chamber wall, wherein while the beltlike substrate is moved in a longitudinal direction thereof, a film-forming gas is introduced through a gas supply device into the film-forming space and microwave energy is radiated from a microwave applicator into the film-forming space to induce a microwave plasma therein, thereby forming a non-single-crystal semiconductor thin film on a surface of the beltlike substrate, and wherein a cooling mechanism and a temperature-increasing mechanism are provided such that the mechanisms cover a part of an outside surface of the deposition chamber wall, an apparatus of forming a non-single-crystal semiconductor thin film comprising a film deposition chamber having a film-forming space surrounded by a film deposition chamber wall and a beltlike substrate, and an external chamber surrounding the deposition chamber wall, wherein while the beltlike substrate is moved in a longitudinal direction thereof, a film-forming gas is introduced through a gas supply device into the film-forming space and a plasma is induced in the film-forming space, thereby forming a non-single-crystal semiconductor thin film on a surface of the beltlike substrate, and wherein the gas supply device comprises a gas manifold, the gas manifold being provided apart from the deposition chamber wall, methods of forming a non-single-crystal semiconductor thin film using the above forming apparatus and methods of producing a photovoltaic device by using the methods of forming the thin film. These permit a non-single-crystal semiconductor thin film to be formed across a large area on the substrate and with high quality and excellent uniformity. IMAGE
机译:提供一种形成非单晶半导体薄膜的装置,该装置包括:具有由成膜空间包围的成膜空间的成膜室,该成膜空间被成膜室壁和带状基板包围;以及外室,其包围成膜室壁。带状基体沿其纵向移动,成膜气体通过供气装置引入成膜空间,微波能量从微波辐射器辐射到成膜空间,从而在其中感应出微波等离子体从而在带状基板的表面上形成非单晶半导体薄膜,并且其中设置有冷却机构和升温机构,使得该机构覆盖沉积室壁的一部分外表面,一种形成非单晶半导体薄膜的装置,该装置包括具有成膜空间的成膜室由膜沉积室壁和带状基板以及围绕该沉积室壁的外部室构成,其中当带状基板沿其纵向移动时,成膜气体通过气体供应装置被引入膜中形成空间中,在膜形成空间中引起等离子体,从而在带状基板的表面上形成非单晶半导体薄膜,并且其中,气体供给装置包括气体歧管,该气体歧管设置有除了沉积室壁之外,使用上述形成设备形成非单晶半导体薄膜的方法以及通过使用形成薄膜的方法来制造光伏器件的方法。这些允许非单晶半导体薄膜形成在基板上的大面积上并且具有高质量和优异的均匀性。 <图像>

著录项

  • 公开/公告号DE69738345T2

    专利类型

  • 公开/公告日2008-11-13

    原文格式PDF

  • 申请/专利权人 CANON K.K.;

    申请/专利号DE19976038345T

  • 发明设计人

    申请日1997-12-16

  • 分类号H01L31/20;H01L31/075;H01L21/205;C23C16/24;

  • 国家 DE

  • 入库时间 2022-08-21 19:07:45

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