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COMPOSITION FOR FORMING RESIST UNDERFILM, RESIST UNDERFILM, METHOD FOR FORMING THE RESIST UNDERFILM, AND METHOD FOR FORMING PATTERN
COMPOSITION FOR FORMING RESIST UNDERFILM, RESIST UNDERFILM, METHOD FOR FORMING THE RESIST UNDERFILM, AND METHOD FOR FORMING PATTERN
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机译：形成抗蚀底胶的组合物，抗蚀底胶，形成抗蚀底胶的方法和形成图案的方法
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摘要
PROBLEM TO BE SOLVED: To provide a composition for forming a resist underfilm with excellent etching durability.;SOLUTION: The composition for forming a resist underfilm contains a compound having a repeating unit expressed by general formula (1) and an organic solvent. In general formula (1), X represents a predetermined group; and n is 0 or 1.;COPYRIGHT: (C)2010,JPO&INPIT
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