PLASMA CVD SYSTEM AND METHOD FOR PRODUCING MAGNETIC RECORDING MEDIUM

摘要

PROBLEM TO BE SOLVED: To provide a plasma CVD system where the distance between a cathode and the substrate to be film-deposited is elongated, thus a thin, dense film having high hardness can be deposited on the substrate to be film-deposited.;SOLUTION: The plasma CVD system comprises: a cathode electrode 3 arranged inside a chamber 2; an anode electrode 4 provided so as to surround the circumference of the cathode electrode 3; a holding part holding the substrate 1 to be film-deposited arranged so as to face the cathode electrode 3 and the anode electrode 4; a plasma wall 8 made into a float potential; an a.c. power source 5 connected to the cathode electrode 3; a d.c. power source 7 connected to the anode electrode 4; and a d.c. power source 12 electrically connected to the substrate 1 to be film-deposited. The inside diameter of the cylindrical plasma wall 8 is 100-200 mm, and the distance between the cathode electrode 3 and the substrate 1 to be film-deposited is 200-300 mm.;COPYRIGHT: (C)2010,JPO&INPIT