首页> 外国专利> PROGRAM OR SYSTEM FOR USE LIMIT ESTIMATION ANALYSIS OF SEMICONDUCTOR STORAGE DEVICE

PROGRAM OR SYSTEM FOR USE LIMIT ESTIMATION ANALYSIS OF SEMICONDUCTOR STORAGE DEVICE

机译:半导体存储设备使用极限估计分析的程序或系统

摘要

PPROBLEM TO BE SOLVED: To provide a program for a use limit estimated time analysis of a semiconductor storage device that can specify a use limit estimated time (an estimated life) from immediately after starting to use a new semiconductor storage device. PSOLUTION: The program for the use limit estimated time analysis of the semiconductor storage device provides: a maximum value computing process for computing the maximum value of an erase count from the capacity of the semiconductor storage device and storing it in a storage means; an erase count acquisition process for acquiring the erase count every fixed cycle; and an erase count storage process for storing the erase count and the acquisition time of the erase count in the storage means; an arithmetic process for computing a rise coefficient based on the temporal transition of the erase count on condition that the erase count acquisition process was carried out a plurality of times, and computing the use limit estimated time of the semiconductor storage device in relation to the maximum value of the erase count stored in the storage means; and a use limit display output process for outputting use limit estimation information to a display means from a display/output means based on the use limit estimated time computed in the arithmetic process. PCOPYRIGHT: (C)2010,JPO&INPIT
机译:

要解决的问题:提供一种用于半导体存储设备的使用极限估计时间分析的程序,该程序可以指定从开始使用新的半导体存储设备后立即开始的使用极限估计时间(估计寿命)。解决方案:用于半导体存储设备的使用极限估计时间分析的程序提供:最大值计算过程,用于从半导体存储设备的容量计算擦除计数的最大值并将其存储在存储装置中。 ;擦除次数获取处理,用于每固定周期获取擦除次数;擦除计数存储过程,用于将擦除计数和擦除计数的获取时间存储在存储装置中。算术处理,该算术处理用于在多次执行擦除次数获取处理的情况下基于擦除次数的时间变化来计算上升系数,并且计算相对于最大值的半导体存储装置的使用极限估计时间存储在存储装置中的擦除计数的值;使用限制显示输出处理,用于基于算术处理中计算出的使用限制估计时间,从显示/输出单元向显示装置输出使用限制估计信息。

版权:(C)2010,日本特许厅&INPIT

著录项

  • 公开/公告号JP2010061578A

    专利类型

  • 公开/公告日2010-03-18

    原文格式PDF

  • 申请/专利权人 JDS:KK;

    申请/专利号JP20080229017

  • 申请日2008-09-05

  • 分类号G06F12/16;

  • 国家 JP

  • 入库时间 2022-08-21 19:04:41

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