首页> 外国专利> DEGASSING DEVICE OF VACUUM TREATMENT APPARATUS, DEGASSING METHOD OF VACUUM TREATMENT APPARATUS, AND VACUUM TREATMENT APPARATUS

DEGASSING DEVICE OF VACUUM TREATMENT APPARATUS, DEGASSING METHOD OF VACUUM TREATMENT APPARATUS, AND VACUUM TREATMENT APPARATUS

机译:真空处理装置的除尘装置,真空处理装置的除尘方法和真空处理装置

摘要

PROBLEM TO BE SOLVED: To provide a degassing device of a vacuum treatment apparatus capable of properly performing degassing treatment, a degassing method of the vacuum treatment apparatus, and the vacuum treatment apparatus.;SOLUTION: The degassing device of the vacuum treatment apparatus 1 which is assembled in the vacuum treatment apparatus 1 having a vacuum chamber 2 treating a work piece W connected to a vacuum suction device 31 through a vacuum piping 32, and which removes absorbed gas absorbed on to the inside of the vacuum treatment apparatus 1, cooperating with the vacuum suction device 31 is provided with: a heated gas supplying device 12 communicating with a carrier gas source 16 of a carrier gas for removing the absorbed gas, and heating the carrier gas to supply to the vacuum chamber 2; and a gas cooling device 33 provided through the vacuum piping 32 in the vicinity of the upstream side of the vacuum suction device 31, and cooling the carrier gas sucked by the vacuum suction device 31.;COPYRIGHT: (C)2010,JPO&INPIT
机译:解决的问题:提供一种能够适当地进行脱气处理的真空处理装置的脱气装置,该真空处理装置的脱气方法以及该真空处理装置。解决方案:真空处理装置1的脱气装置,其特征在于,真空处理设备1组装在具有真空室2的真空处理设备1中,该真空室2处理通过真空管道32连接至真空抽吸装置31的工件W,并且该真空室2与吸附在真空处理设备1内部的吸收气体一起去除。真空吸引装置31具备:与载气的载气源16连通的加热气体供给装置12,该载气的载气源16用于除去吸收的气体,并对该载气进行加热而向真空室2供给。气体冷却装置33,其通过在真空抽吸装置31的上游侧附近的真空管道32设置,并冷却由真空抽吸装置31抽吸的载气。;版权所有:(C)2010,JPO&INPIT

著录项

  • 公开/公告号JP2010142765A

    专利类型

  • 公开/公告日2010-07-01

    原文格式PDF

  • 申请/专利权人 SEIKO EPSON CORP;

    申请/专利号JP20080324951

  • 发明设计人 KAWAMURA KAZUHARU;

    申请日2008-12-22

  • 分类号B01J3/00;C23C16/44;H01L21/205;H01L21/31;

  • 国家 JP

  • 入库时间 2022-08-21 19:04:12

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