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METAL MATERIAL AND MANUFACTURING METHOD THEREOF, AND CASE FOR ELECTRONIC EQUIPMENT USING THE SAME

机译:金属材料及其制造方法,以及使用该金属材料和电子设备的情况

摘要

PROBLEM TO BE SOLVED: To provide a metal material wherein a photocatalytic layer is less degraded, high catalytic performance is obtained, and a metallic taste of a substrate is maintained because of high transparency of the layer, and also to provide a manufacturing method thereof and a case for electronic equipment using the same.;SOLUTION: The metal material comprises a metal substrate, and a metal oxide film, composed of a metal oxide having photocatalytic action and substantially containing no impurity, on the surface of the metal substrate. The metal material preferably has a compound oxide produced by reacting the metal substrate with the metal oxide on the interface between the metal substrate and the metal oxide.;COPYRIGHT: (C)2010,JPO&INPIT
机译:解决的问题:提供一种金属材料,其中光催化层的降解度较小,获得高催化性能,并且由于该层的高透明性而保持了基材的金属味,还提供了其制造方法和解决方案:金属材料包括金属基板和金属氧化物膜,该金属氧化物膜由具有光催化作用且基本上不包含杂质的金属氧化物组成,该金属氧化物膜位于金属基板的表面上。金属材料优选具有通过使金属基底与金属氧化物在金属基底和金属氧化物之间的界面上反应而产生的复合氧化物。版权所有:(C)2010,日本特许厅&INPIT

著录项

  • 公开/公告号JP2010036172A

    专利类型

  • 公开/公告日2010-02-18

    原文格式PDF

  • 申请/专利权人 SUMITOMO ELECTRIC IND LTD;

    申请/专利号JP20080205550

  • 发明设计人 OKUDA NOBUYUKI;INOUE RYUICHI;

    申请日2008-08-08

  • 分类号B01J35/02;B01J37/02;

  • 国家 JP

  • 入库时间 2022-08-21 19:03:44

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