FERRITE FILM FORMATION METHOD ON SURFACE OF PLANT COMPONENT, FERRITE FILM FORMATION DEVICE, AND QUARTZ OSCILLATOR ELECTRODE DEVICE

摘要

PPROBLEM TO BE SOLVED: To provide a ferrite film formation method on the surface of a plant component, shortening a time required until a ferrite film formation work is finished. PSOLUTION: A film formation device is connected to a recirculation system pipe of a BWR plant which is a plant component (step S1). A film formation aqueous solution containing a pH adjusting agent, an agent containing ferrous (II) ion and an oxidizing agent is supplied from the film formation device to the recirculation system pipe (step S4-S6). A ferrite film is formed on the inner surface having a contact with the film formation aqueous solution in the recirculation system pipe. A formation amount of the ferrite film is measured by a quartz oscillator electrode device arranged in a film formation liquid pipe to which the film formation aqueous solution in the film formation device is supplied (step S7). It is determined whether the thickness of the ferrite film acquired based on the measured ferrite film amount becomes equal to a set thickness (step S8). When the thickness of the film becomes equal to the set thickness, the ferrite film formation work is finished. PCOPYRIGHT: (C)2010,JPO&INPIT