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Method of applying improved scattering bar OPC for lithography patterning below half wavelength
Method of applying improved scattering bar OPC for lithography patterning below half wavelength
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机译:在半波长以下的光刻图案上应用改进的散射棒OPC的方法
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摘要
A method of forming a mask having optical proximity correction features, which includes the steps of obtaining a target pattern of features to be imaged, expanding the width of the features to be imaged, modifying the mask to include assist features which are placed adjacent the edges of the features to be imaged, where the assist features have a length corresponding to the expanded width of the features to be imaged, and returning the features to be imaged from the expanded width to a width corresponding to the target pattern.
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