COMPOSITION FOR FORMING COATING TYPE INORGANIC SILICA-BASED FILM, COATING TYPE INORGANIC SILICA-BASED FILM USING THE COMPOSITION, AND ELECTRONIC COMPONENT HAVING THE FILM

摘要

PROBLEM TO BE SOLVED: To provide a composition for forming a coating type inorganic silica-based film which is excellently buried in a substrate having unevenness, a coating type inorganic silica-based film obtained from the composition, and an electronic component having the coating type inorganic silica-based film.;SOLUTION: The composition for forming the coating type inorganic silica-based film is characterized in that a catalyst used for hydrolysis of tetraalkoxy silane is maleic acid, and weight-average molecular weight of an obtained siloxane resin in a solution is 500 to 3,000.;COPYRIGHT: (C)2010,JPO&INPIT