COATING-TYPE SILICA-BASED FILM-FORMING COMPOSITION, SILICA-BASED FILM USING THE COATING-TYPE SILICA-BASED FILM-FORMING COMPOSITION, AND SEMICONDUCTOR DEVICE USING THE SAME

摘要

PPROBLEM TO BE SOLVED: To provide a silica-based film-forming composition, wherein a silica-based film resin has excellent storage stability even with high concentration thereof and the obtained silica-based film has high mechanical strength and easily secured adhesion to a substrate. PSOLUTION: The coating-type silica-based film-forming composition includes: (A) an alkoxysilane represented by general formulae (1) and (2), wherein RSB1/SBand RSB2/SBare each a 1-3C organic group and may be the same or different; (B) an aprotic organic solvent; (C) a 3-6C monovalent alcohol; and (D) an acid catalyst as essential components, wherein the mass of the component (C) added is 2 to 3 times larger than the mass of the silica resin obtained through hydrolysis and polycondensation reactions of the component (A). PCOPYRIGHT: (C)2011,JPO&INPIT