PROBLEM TO BE SOLVED: To provide a contamination removal device and a contamination removal method capable of removing contaminations with certainty, and to provide a pattern substrate manufacturing method.;SOLUTION: The contamination removal device removes contaminations deposited on a mask 10 wearing a pellicle film 12 through a pellicle frame 11, and includes an ultrasonic transducer 22 having a node on the side of the pellicle film 12 of the mask 10 that generates standing waves by irradiating ultrasonic waves to the mask 10 from the side of the pellicle film 12, and a light source 23 that removes a contamination 15 from the mask 10 by irradiating light to the location of the mask 10 where the contamination 15 is deposited. The contamination removed from the mask 10 is moved to the direction of the node of standing waves, and is deposited to the pellicle film 12 or the pellicle frame 11.;COPYRIGHT: (C)2010,JPO&INPIT
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