Organicity contamination detection removal device and its organicity contamination detection removal manner and chemical contamination detection removal device and its chemical contamination detection removal manner

摘要

PROBLEM TO BE SOLVED: To provide an organic-contamination detecting and removing device having means, which detects the organic contamination that is the cause of the reduction in the yield rate at manufacturing a highly integrated semiconductor at a high speed, analyzes the material components of this contamination additionally at the same time and removes the contamination, and a device for detecting and removing the chemical contamination and the method for detecting and removing the chemical contamination. ;SOLUTION: These methods include following means in the same device. A pair of oppositely facing trenches are formed on a semiconductor silicon wafer 1 as an object under inspection. An organic-contamination detecting means detects the organic contamination by spectrum analysis from the infrared rays emitted from the end surface of the other facing trench after the infrared rays 2 have been inputted from the end surface of one facing trench and multiply reflected inside the semiconductor silicon wafer 1. An optical dry cleaning mechanism removes the organic contamination, when it is determined that there is organic contamination. The means, wherein whether the organic contamination can be removed or not is checked again through the organic- contamination detecting means, is provided.;COPYRIGHT: (C)1999,JPO