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THROUGH-HOLE LAYOUT APPARATUS, AND THROUGH-HOLE LAYOUT METHOD

机译:贯穿孔布局装置和贯穿孔布局方法

摘要

PPROBLEM TO BE SOLVED: To reduce the difference among values of layout density of through-holes on a semiconductor integrated circuit. PSOLUTION: This through-hole layout apparatus includes: an extraction part extracting existing through-holes connecting upper-layer wiring to lower-layer wiring from design data of the semiconductor integrated circuit; a calculation part calculating a layout density in a predetermined range around each of through-holes extracted by the extraction part, for the each through-holes; a selection part selecting, as target through-holes, the through-holes each having the layout density calculated by the calculation part smaller than a predetermined value, from among the through-holes extracted by the extraction part; and an additional layout part determining predetermined positions in the predetermined range centering the target through-holes as additional layout positions of through-holes, and additionally arranging the through-holes at additional layout positions on design data. PCOPYRIGHT: (C)2010,JPO&INPIT
机译:

要解决的问题:减小半导体集成电路上通孔的布局密度值之间的差异。

解决方案:该通孔布局设备包括:提取部,其从半导体集成电路的设计数据中提取将上层布线连接至下层布线的现有通孔。计算部针对每个通孔计算在由提取部提取的每个通孔周围的预定范围内的布局密度;选择部从由提取部提取的贯通孔中,将计算部计算出的布局密度小于规定值的贯通孔选择为目标贯通孔。附加布置部分,将以目标通孔为中心的预定范围内的预定位置确定为通孔的附加布置位置,并在设计数据上的附加布置位置处附加布置通孔。

版权:(C)2010,日本特许厅&INPIT

著录项

  • 公开/公告号JP2009295854A

    专利类型

  • 公开/公告日2009-12-17

    原文格式PDF

  • 申请/专利权人 ELPIDA MEMORY INC;

    申请/专利号JP20080149172

  • 发明设计人 OISHI HAYATO;MATSUKI KAZUHIKO;

    申请日2008-06-06

  • 分类号H01L21/82;G06F17/50;

  • 国家 JP

  • 入库时间 2022-08-21 19:01:55

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