Patent Issued for Method for Circuit Layout and Rapid Thermal Annealing Method for Semiconductor Apparatus

摘要

2013 MAR 20 (VerticalNews) -- By a News Reporter-Staff News Editor at Journal of Engineering -- FromnAlexandria, Virginia, VerticalNews journalists report that a patent by the inventors Ju, Jianhua (Shanghai,nCN); Ning, Xian J. (Shanghai, CN), filed on September 8, 2010, was cleared and issued on March 5,n2013.