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Semiconductor structures and processing method using a phase separation less III-nitride material system 4 yuan

机译:半导体结构及加工方法采用相分离少的III族氮化物材料系统4元

摘要

(57) Abstract Being III family nitride 4 original material system and the method of using for the semiconductor structure which includes the laser diode, the transistor and the photodetector, it decreases or removes phase separation, or, it discloses those which at the same time raise luminous efficiency. In illustrate execution feature, the said semiconductor structure the 1st InGaAlN layer which does not have substantially the phase separation of 1st electric conduction type, includes the 2nd InGaAlN layer which InGaAlN active layer, or the opposite electric conduction type which substantially do not have phase separation does not have phase separation substantially.
机译:(57)<摘要>作为III族氮化物4族原始材料体系及其用于包括激光二极管,晶体管和光电检测器的半导体结构的方法,其减少或消除了相分离,或者公开了那些同时提高发光效率。在例示执行特征中,所述半导体结构为实质上不具有第一导电型的相分离的第一InGaAlN层,包括实质上不具有相分离的InGaAlN活性层的第二InGaAlN层或相反的导电型。基本上没有相分离。

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